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Volumn 102, Issue 32, 1998, Pages 6219-6224

Reduction of tin oxide by hydrogen radicals

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000597999     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp981447l     Document Type: Article
Times cited : (45)

References (21)
  • 4
    • 11744353622 scopus 로고    scopus 로고
    • Plasma induced changes to TCO/a-Si:H interfaces
    • Hack, M., Schiff, E. A., Wagner, S., Schropp, R., Matsuda, A., Eds.; Materials Research Society: Pittsburgh, PA
    • Wallinga, J.; Knoesen, D.; Hamers, E. A. G.; van Sark, W. G. J. H. M.; van der Weg, W. F.; Schropp, R. E. I. Plasma induced changes to TCO/a-Si:H interfaces. In Amorphous Silicon Technology - 1996; Hack, M., Schiff, E. A., Wagner, S., Schropp, R., Matsuda, A., Eds.; Materials Research Society: Pittsburgh, PA, 1996.
    • (1996) Amorphous Silicon Technology - 1996
    • Wallinga, J.1    Knoesen, D.2    Hamers, E.A.G.3    Van Sark, W.G.J.H.M.4    Van Der Weg, W.F.5    Schropp, R.E.I.6
  • 6
    • 0028694579 scopus 로고
    • Investigation of TCO/ p-interface and surface morphology of a-Si:H solar cells by in-situ ellipsometry
    • IEEE: Piscataway, NJ
    • Wanka, H. N.; Schubert, M. B.; Lotter, E., Investigation of TCO/ p-interface and surface morphology of a-Si:H solar cells by in-situ ellipsometry. In First WCPEC, Hawaii; IEEE: Piscataway, NJ, 1994; pp 516-519.
    • (1994) First WCPEC, Hawaii , pp. 516-519
    • Wanka, H.N.1    Schubert, M.B.2    Lotter, E.3
  • 18
    • 11744305785 scopus 로고    scopus 로고
    • Ion energy distributions in silane-hydrogen plasmas
    • Hack, M., Schiff, E. A., Wagner, S., Schropp, R., Matsuda, A., Eds.; Materials Research Society: Pittsburgh, PA
    • Hamers, E. A. G.; van Sark, W. G. J. H. M.; Bezemer, J.; van der Weg, W. F.; Goedheer, W. J. Ion energy distributions in silane-hydrogen plasmas. In Amorphous Silicon Technology-1996; Hack, M., Schiff, E. A., Wagner, S., Schropp, R., Matsuda, A., Eds.; Materials Research Society: Pittsburgh, PA, 1996.
    • (1996) Amorphous Silicon Technology-1996
    • Hamers, E.A.G.1    Van Sark, W.G.J.H.M.2    Bezemer, J.3    Van Der Weg, W.F.4    Goedheer, W.J.5
  • 20
    • 11744294514 scopus 로고    scopus 로고
    • Private communication
    • Feenstra, K. F. Private communication.
    • Feenstra, K.F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.