A statistical parameter study of indium tin oxide thin films deposited by radio-frequency sputtering

Thin Solid Films

Volumn 476, Issue 1, 2005, Pages 59-64

  Jun, Seung Ik ^a   McKnight, Timothy E ^b   Simpson, Michael L ^a,b   Rack, Philip D ^a  

^a University of Tennessee Knoxville   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

Indium tin oxide (ITO); Sputtering; Taguchi design; Transparent electrode

Indexed keywords

CRYSTALLINE MATERIALS; DEPOSITION; ELECTRODES; INDIUM; SPUTTER DEPOSITION; STATISTICAL METHODS; X RAY DIFFRACTION ANALYSIS;

INDIUM TIN OXIDE (ITO); TAGUCHI DESIGN; TEMPERATURE DEPOSITION; TRANSPARENT ELECTRODES;

THIN FILMS;

EID: 13844298166     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.09.011     Document Type: Article

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