Sub-wavelength patterning of organic monolayers via nonlinear processing with continuous-wave lasers

New Journal of Physics

Volumn 12, Issue , 2010, Pages

  Mathieu, Mareike ^a   Hartmann, Nils ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AU FILM; EFFECTIVE KINETIC PARAMETERS; FOCUSED BEAMS; FUNCTIONALIZED; HEXADECANETHIOL; LASER INDUCED; LASER INTENSITIES; LASER PATTERNING; LATERAL DIMENSION; LOCAL TEMPERATURE; NANOPATTERNING; NONLINEAR DEPENDENCE; NONLINEAR LASERS; NONLINEAR PROCESSING; ORGANIC MONOLAYERS; PATTERNING PROCESS; PHOTO-THERMAL; SELECTIVE ETCHING; SILICON SUBSTRATES; SPOT DIAMETER; SUB-100 NM; SUB-WAVELENGTH; SUBWAVELENGTH RESOLUTION; SUPPORTED MEMBRANE; THERMALLY ACTIVATED; THERMOKINETIC ANALYSIS; THIOL MOLECULES; ULTRA-THIN;

CONTINUOUS WAVE LASERS; DESORPTION; ELECTRON ENERGY LEVELS; GOLD; MONOLAYERS; ORGANIC COATINGS;

ORGANIC LASERS;

EID: 78651313728     PISSN: 13672630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1367-2630/12/12/125017     Document Type: Article

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