Sub-micron scale patterning using femtosecond laser and self-assembled monolayers interaction

Applied Surface Science

Volumn 240, Issue 1-4, 2005, Pages 296-304

  Chang, Wonseok ^a   Choi, Moojin ^a   Kim, Jaegu ^a   Cho, Sunghak ^a   Whang, Kyunghyun ^a  

^a Korea Institute of Machine and Materials   (South Korea)

Author keywords

Femtosecond laser patterning; Photodecomposition; Photooxidation; Self assembled monolayer

Indexed keywords

ADSORPTION; ELECTRIC EXCITATION; ETCHING; LASERS; PHOTOLITHOGRAPHY; PHOTOOXIDATION; PHOTORESISTORS; ULTRAVIOLET RADIATION;

FEMTOSECOND LASER PATTERNING; MICRO-SYSTEMS; PHOTODECOMPOSITION; ULTRAFAST LASERS;

SELF ASSEMBLY;

EID: 10444269466     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.06.157     Document Type: Article

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