Maskless nonlinear lithography with femtosecond laser pulses

Applied Physics A: Materials Science and Processing

Volumn 82, Issue 1 SPEC. ISS., 2006, Pages 23-26

  Koch, J ^a   Fadeeva, E ^a   Engelbrecht, M ^a   Ruffert, C ^b   Gatzen, H H ^b   Ostendorf, A ^a   Chichkov, B N ^a  

^a LASER ZENTRUM HANNOVER E V   (Germany)

^b LEIBNIZ UNIVERSITY HANNOVER   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; OPTICAL RESOLVING POWER;

FEMTOSECOND LASERS; MASKLESS LITHOGRAPHY; PHOTOMASK COST MASK;

LASER PULSES;

EID: 29144503182     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-005-3418-7     Document Type: Article

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