Direct laser patterning of octadecylsiloxane monolayers on surface-oxidized silicon substrates: Indications for a photothermal excitation mechanism

Surface Science

Volumn 600, Issue 18, 2006, Pages 4034-4038

  Hartmann, Nils ^a   Balgar, Thorsten ^a   Bautista, Rafael ^a   Franzka, Steffen ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

Laser beam lithography; Laser direct writing; OTS; Photothermal patterning; Self assembled monolayer

Indexed keywords

DECOMPOSITION; LASER BEAM EFFECTS; LITHOGRAPHY; OXIDATION; SELF ASSEMBLY; SILICA; SILICON; THERMAL EFFECTS;

LASER BEAM LITHOGRAPHY; LASER DIRECT WRITING; PHOTOTHERMAL EXCITATION; PHOTOTHERMAL PATTERNING;

ORGANOMETALLICS;

EID: 33748936867     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2006.01.118     Document Type: Article

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