Effect of high temperature annealing on conduction-type ZnO films prepared by direct-current magnetron sputtering

Chinese Physics Letters

Volumn 27, Issue 12, 2010, Pages

  Sun, Li Jie ^a   He, Dong Kai ^a   Xu, Xiao Qiu ^a   Zhong, Ze ^a   Wu, Xiao Peng ^a   Lin, Bi Xia ^a   Fu, Zhu Xi ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; II-VI SEMICONDUCTORS; MAGNETRON SPUTTERING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

AMBIENTS; CONDUCTION TYPE; D.C. MAGNETRON SPUTTERING; DC MAGNETRON SPUTTERING; DIRECT CURRENT MAGNETRON SPUTTERING; DIRECT-CURRENT MAGNETRON SPUTTERING; HIGH-TEMPERATURE ANNEALING; P-TYPE; ZNO FILMS; ZNO THIN FILM;

METALLIC FILMS;

EID: 78651068518     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/27/12/126802     Document Type: Article

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