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Applied Surface Science

Volumn 257, Issue 6, 2011, Pages 1990-1995

A magnetron sputtering technique to prepare a-C:H films: Effect of substrate bias

(6) Wang, Yongxia a,b Ye, Yinping a Li, Hongxuan a Ji, Li a Chen, Jianmin a Zhou, Huidi a

a LANZHOU INSTITUTE OF CHEMICAL PHYSICS (China)

b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES (China)

Author keywords

a C:H film; Magnetron sputtering; Microstructure; Substrate bias; Tribological property

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON FILMS; FRICTION; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; MICROSTRUCTURE; POLYMER FILMS;

A-C:H FILMS; AMORPHOUS HYDROGENATED CARBON (A-C:H) FILMS; FRICTION COEFFICIENTS; MORPHOLOGY AND MECHANICAL PROPERTIES; POLYMER-LIKE STRUCTURES; SUBSTRATE BIAS; SUBSTRATE BIAS VOLTAGES; TRIBOLOGICAL PROPERTIES;

BIAS VOLTAGE;

EID: 78650265953 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2010.09.040 Document Type: Article

Times cited : (49)

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