Effect of substrate bias voltage on the properties of diamond-like carbon thin films deposited by microwave surface wave plasma CVD

Diamond and Related Materials

Volumn 17, Issue 4-5, 2008, Pages 696-699

  Adhikari, Sudip ^a   Ghimire, Dilip Chandra ^a   Aryal, Hare Ram ^a   Kalita, Golap ^a   Umeno, Masayoshi ^a  

^a CHUBU UNIVERSITY   (Japan)

Author keywords

Bias voltage; DLC film; Microwave surface wave plasma CVD; Optical properties

Indexed keywords

BIAS VOLTAGE; OPTICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE WAVES; THIN FILMS;

DIAMOND-LIKE CARBON (DLC) THIN FILMS; MICROWAVE SURFACE WAVE PLASMA CHEMICAL VAPOR DEPOSITION (MW SWP-CVD); MICROWAVE SURFACE-WAVE PLASMA CVD;

DIAMOND LIKE CARBON FILMS;

EID: 42949084346     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2007.10.006     Document Type: Article

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