Substrate bias effects during diamond like carbon film deposition by microwave ECR plasma CVD

Current Applied Physics

Volumn 8, Issue 1, 2008, Pages 6-12

  Dey, R M ^a,b   Singh, S B ^a,b   Biswas, A ^a,b   Tokas, R B ^a,b   Chand, N ^a,b   Venkateshwaran, S ^a,b   Bhattacharya, D ^a,b   Sahoo, N K ^a,b   Gosavi, S W ^a,b   Kulkarni, S K ^a,b   Patil, D S ^a,b  

^a BHABHA ATOMIC RESEARCH CENTRE   (India)

^b UNIVERSITY OF PUNE   (India)

Author keywords

Atomic force microscopy; Contact angle; Diamond like carbon; Electron cyclotron resonance; Roughness; Spectroscopic ellipsometry; X ray photoelectron spectroscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CONTACT ANGLE; ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ELLIPSOMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON BONDING; SUBPLANTATION MODEL;

DIAMOND LIKE CARBON FILMS;

EID: 34548490750     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2007.03.010     Document Type: Article

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