Influence of RF PACVD process parameters of diamond-like carbon films on optical properties and nano-hardness of the films

Diamond and Related Materials

Volumn 17, Issue 7-10, 2008, Pages 1655-1659

  Smietana, M ^a   Szmidt, J ^a   Korwin Pawlowski, M L ^b   Miller, N ^c   Elmustafa, A A ^c  

^a WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

^b UNIVERSITÉ DU QUÉBEC EN OUTAOUAIS   (Canada)

^c OLD DOMINION UNIVERSITY   (United States)

Author keywords

Diamond like carbon; Mechanical properties; Optical properties; Plasma CVD

Indexed keywords

ABSORPTION; ARGON; BIAS VOLTAGE; CARBON FILMS; DIAMOND FILMS; DIAMOND LIKE CARBON FILMS; DIAMONDS; ELASTIC MODULI; ELASTICITY; GAS ABSORPTION; GEOMETRICAL OPTICS; HARDNESS; HYDROCARBONS; INERT GASES; MECHANICAL PROPERTIES; METHANE; MOLECULAR BEAM EPITAXY; NONMETALS; OPTICAL MATERIALS; OPTICAL PROPERTIES; ORGANIC COMPOUNDS; ORGANIC POLYMERS; PHOTONICS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SEMICONDUCTING CADMIUM TELLURIDE; SILICON; SPECTROSCOPIC ELLIPSOMETRY;

CHEMICAL VAPOUR DEPOSITION; DIAMOND-LIKE; DIAMOND-LIKE CARBON; EXTINCTION CO-EFFICIENT; IN-FIELD; INDEX OF REFRACTION; INFRARED RANGE; NANO-HARDNESS; NANOINDENTATION METHODS; OPTICAL ABSORPTION; OPTICAL PARAMETERS; P-TYPE SILICON; PLASMA CVD; PROCESS CONDITIONS; PROCESS PARAMETERS; RADIO FREQUENCY PLASMAS; SELF-BIAS VOLTAGES; SOURCE GASES; VISIBLE RANGE; YOUNG'S MODULUS;

OPTICAL FILMS;

EID: 48849087898     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.01.111     Document Type: Article

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