Superlow friction behavior of Si-doped hydrogenated amorphous carbon film in water environment

Surface and Coatings Technology

Volumn 203, Issue 8, 2009, Pages 981-985

  Zhao, F ^a,b   Li, H X ^a   Ji, L ^a,b   Mo, Y F ^a,b   Quan, W L ^a,b   Du, W ^a,b   Zhou, H D ^a   Chen, J M ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

a C:H:Si film; Superlow friction coefficient; Tribochemical reaction; Water environment

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS SILICON; CARBON FILMS; DIAMOND FILMS; DIAMONDS; ELECTROMAGNETIC WAVES; FRICTION; HYDROGENATION; PHOTOELECTRON SPECTROSCOPY; PLASMA DEPOSITION; SILICA; SILICIDES; SILICON; SILICON CARBIDE; SILICON COMPOUNDS; TRIBOLOGY; WATER VAPOR; X RAY ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

A-C:H:SI FILM; ATOMIC CONCENTRATIONS; BOUNDARY LUBRICATIONS; COLLOIDAL SILICAS; FRICTION BEHAVIORS; HYDROGENATED AMORPHOUS CARBON FILMS; HYDROGENATED AMORPHOUS CARBONS; RADIO FREQUENCIES; RAMAN SPECTROMETRIES; SI FILMS; SPUTTERING DEPOSITIONS; SUPERLOW FRICTION COEFFICIENT; SUPERLOW FRICTIONS; TRIBOCHEMICAL REACTION; TRIBOCHEMICAL REACTIONS; TRIBOMETER; WATER ENVIRONMENT; WATER ENVIRONMENTS; WATER MOLECULES; X-RAY DIFFRACTIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 57549116197     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.09.025     Document Type: Article

References (29)

1. Gilmore R., and Hauert R. Surf. Coat. Technol. 133-134 (2000) 437
2. Ohana T., Nakamura T., Suzuki M., Tanaka A., and Koga Y. Diamond Relat. Mater. 13 (2004) 1500
3. Li H., Xu T., Wang C., Chen J., Zhou H., and Liu H. J. Phys. D: Appl. Phys. 38 (2005) 62
4. Li H., Xu T., Wang C., Chen J., Zhou H., and Liu H. Appl. Surf. Sci. 249 (2005) 257
5. Li H., Xu T., Wang C., Chen J., Zhou H., and Liu H. Diamond Relat. Mater. 15 (2006) 1585
6. Oguri K., and Arai T. Surf. Coat. Technol. 47 (1991) 710
7. Oguri K., and Arai T. Thin Solid Films 208 (1992) 158
8. Ohana T., Nakamura T., Suzuki M., Tanaka A., and Koga Y. Diamond Relat. Mater. 13 (2004) 1500
9. Ohana T., Suzuki M., Nakamura T., Tanaka A., and Koga Y. Diamond Relat. Mater. 14 (2005) 1089
10. Erdemir A., and Donnet C. J. Phys. D: Appl. Phys. 39 (2006) 311
11. Li H., Xu T., Wang C., Chen J., Zhou H., and Liu H. Tribo. Lett. 19 (2005) 231
12. Li H., Xu T., Wang C., Chen J., Zhou H., and Liu H. Diamond Relat. Mater. 15 (2006) 1228
13. Ohana T., Wu X., Nakamura T., and Tanaka A. Diamond Relat. Mater. 16 (2007) 1336
14. Ohana T., Suzuki M., Nakamura T., Tanaka A., and Koga Y. Diamond Relat. Mater. 15 (2006) 962
15. Wu X., Ohana T., Tanaka A., Kubo T., Nanao H., Minami I., and Mori S. Diamond Relat. Mater. 17 (2008) 147
16. Wu X.Y., Suzuki M., Ohana T., and Tanaka A. Diamond Relat. Mater. 17 (2008) 7
17. Wu X., Ohana T., Tanaka A., Kubo T., Nanao H., Minami I., and Mori S. Appl. Surf. Sci. 254 (2008) 3397
18. Xu J.G., and Kato K. Wear. 245 (2000) 61
19. Zhou F., Kato K., and Adachi K. Tribo. Lett. 18 (2005) 153
20. Ferrari A.C., and Robertson J. Phys. Rev. B 63 (2001) 121405
21. Zhang X., Weber W.H., Vassell W.C., Potter T.J., and Tamor M.A. J. Appl. Phys. 83 (1998) 2820
22. Veres M., Koós M., th S.T., Fule M., csik I.P., th A.T., Mohai M., and ti I.B. Diamond Relat. Mater. 14 (2005) 1051
23. Fourches N., Turban G., and Grolleau B. Appl. Surf. Sci. 68 (1993) 149
24. Wu W.J., Pai T.M., and Hon M.H. Diamond Relat. Mater. 7 (1998) 1478
25. Fang L., Gao Y.M., and Zhang Z. Wear 225-229 (1999) 896
26. Sugita T., Ueda K., and Kanemura Y. Wear 97 (1984) 1
27. Xu J., Kato K., and Hirayama T. Wear 205 (1997) 55
28. Vila M., Carrapichano J.M., Gomes J.R., Camargo Jr. S.S., Achete C.A., and Silva R.F. Wear 265 (2008) 940
29. Fischer T.E., Zhu Z., Kim H., and Shin D.S. Wear 245 (2000) 53