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Journal of Vacuum Science and Technology B

Volumn 28, Issue 6, 2010, Pages

Fabrication of seamless three-dimensional roll mold using direct electron-beam writing on rotating cylindrical substrate

(3) Taniguchi, Jun a Tsuji, Shintaro a Aratani, Masao a

a TOKYO UNIVERSITY OF SCIENCE (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; FABRICATION; GLASS SUBSTRATES; MOLDS; SPIN GLASS;

ACCELERATION VOLTAGES; BEAM DOSE; CYLINDRICAL SUBSTRATE; DIRECT ELECTRON BEAM WRITING; ELECTRON BEAM RESIST; ELECTRON-BEAM; ELECTRON-BEAM LITHOGRAPHY; HYDROGEN SILSESQUIOXANE; LINE-WIDTH; VOLTAGE ELECTRONS;

ELECTRON BEAMS;

EID: 78650092239 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3511474 Document Type: Article

Times cited : (6)

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