Nanoimprint lithography of sub-100 nm 3D structures

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 653-658

  Konijn, M ^a   Alkaisi, M M ^a   Blaikie, R J ^a  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

Author keywords

3D Nanoimprint lithography; Low temperature imprint; Reactive ion etching; Silicon nitride molds

Indexed keywords

ADHESION; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; ELECTRON BEAM LITHOGRAPHY; GLASS TRANSITION; LOW TEMPERATURE EFFECTS; MICROELECTROMECHANICAL DEVICES; MOLDS; POLYMETHYL METHACRYLATES; REACTIVE ION ETCHING; SILICON NITRIDE; SPIN COATING;

3D NANOIMPRINT LITHOGRAPHY (NIL); HEXAMETHYLDISILAZINE (HMDS); LOW TEMPERATURE IMPRINT; NANOIMPRINT MOLDS; SILICON NITRIDE MOLDS;

NANOTECHNOLOGY;

EID: 14944367548     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.12.081     Document Type: Conference Paper

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