Evaluation of each electron beam and exposure results with four column cells in multicolumn e-beam exposure system

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2518-2523

  Yamada, Akio ^a   Yasuda, Hiroshi ^a   Yamabe, Masaki ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM POSITIONS; CHARACTER PROJECTIONS; ELECTRON-BEAM EXPOSURE; EXPOSURE SYSTEM; MULTI-COLUMN CELLS; STITCHING ERRORS;

BAR CODES; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ERRORS;

CELLS;

EID: 72849117368     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3253614     Document Type: Conference Paper

References (7)

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3. A. Yamada and T. Yabe, J. Vac. Sci. Technol. B 21, 2680 (2003).
4. A. Yamada and T. Yabe, J. Vac. Sci. Technol. B 22, 2917 (2004).
5. H. Yasuda, A. Yamada, and M. Yamabe, Proc. SPIE 7028, 70280B (2008).
6. A. Yamada, H. Yasuda, and M. Yamabe, J. Vac. Sci. Technol. B 26, 2025 (2008).
7. A. Yamada, H. Yasuda, and M. Yamabe, Proc. SPIE 7122, 71220K (2008).