Sub-100-nm three-dimensional nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2361-2364

  Unno, Noriyuki ^a   Taniguchi, Jun ^a   Ishii, Yoshiaki ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COST EFFECTIVENESS; ELECTRON BEAM LITHOGRAPHY; ELECTRONS; GLASS; OPTICAL DEVICES;

NANOSCALE PATTERNING;

NANOIMPRINT LITHOGRAPHY;

EID: 37149018311     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2811715     Document Type: Article

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