SCOPUS 정보 검색 플랫폼

Journal of Vacuum Science and Technology B

Volumn 28, Issue 4, 2010, Pages 740-743

Newly developed electron beam stepper for nanoimprint mold fabrication

(6) Okada, Makoto a,b Kishiro, Takashi c Yanagihara, Kaori c Ataka, Masashi c Anazawa, Norimichi c Matsui, Shinji a,b

a UNIVERSITY OF HYOGO (Japan)

b HOLON Co ^* (Japan)

c HOLON Co (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; FABRICATION; MOLDS; NANOIMPRINT LITHOGRAPHY; REACTIVE ION ETCHING; THROUGHPUT;

ELECTRON BEAM SYSTEMS; ELECTRON-BEAM; ELECTRON-BEAM LITHOGRAPHY; HIGH-THROUGHPUT; HOLE PATTERNS; LONG EXPOSURES; MASS PRODUCTION; MOULD FABRICATIONS; NANOIMPRINT MOLDS; SI SUBSTRATES;

SILICA;

EID: 77957226451 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3449270 Document Type: Conference Paper

Times cited : (5)

References (14)

1
- 0142037327
- APPLAB 0003-6951,. 10.1063/1.114851
- S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Appl. Phys. Lett. APPLAB 0003-6951 67, 3114 (1995). 10.1063/1.114851
- (1995) Appl. Phys. Lett. , vol.67 , pp. 3114
- Chou, S.Y.¹ Krauss, P.R.² Renstrom, P.J.³

2
- 0030570065
- SCIEAS 0036-8075,. 10.1126/science.272.5258.85
- S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Science SCIEAS 0036-8075 272, 85 (1996). 10.1126/science.272.5258.85
- (1996) Science , vol.272 , pp. 85
- Chou, S.Y.¹ Krauss, P.R.² Renstrom, P.J.³

3
- 0012752163
- JVTBD9 1071-1023,. 10.1116/1.589752
- S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhuang, J. Vac. Sci. Technol. B JVTBD9 1071-1023 15, 2897 (1997). 10.1116/1.589752
- (1997) J. Vac. Sci. Technol. B , vol.15 , pp. 2897
- Chou, S.Y.¹ Krauss, P.R.² Zhang, W.³ Guo, L.⁴ Zhuang, L.⁵

4
- 0034428895
- JAPNDE 0021-4922,. 10.1143/JJAP.39.7075
- M. Komuro, J. Taniguchi, S. Inoue, N. Kimura, Y. Tokano, H. Hiroshima, and S. Matsui, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 39, 7075 (2000). 10.1143/JJAP.39.7075
- (2000) Jpn. J. Appl. Phys., Part 1 , vol.39 , pp. 7075
- Komuro, M.¹ Taniguchi, J.² Inoue, S.³ Kimura, N.⁴ Tokano, Y.⁵ Hiroshima, H.⁶ Matsui, S.⁷

5
- 11744354228
- JVTBD9 1071-1023,. 10.1116/1.590417
- W. Wu, B. C. X. Sun, W. Zhang, L. Zhuang, L. Kong, and S. Y. Chou, J. Vac. Sci. Technol. B JVTBD9 1071-1023 16, 3825 (1998). 10.1116/1.590417
- (1998) J. Vac. Sci. Technol. B , vol.16 , pp. 3825
- Wu, W.¹ Sun, B.C.X.² Zhang, W.³ Zhuang, L.⁴ Kong, L.⁵ Chou, S.Y.⁶

6
- 22244482198
- Silicon single-electron quantum-dot transistor switch operating at room temperature
- DOI 10.1063/1.121014, PII S0003695198012108
- L. Zhuang, L. Guo, and S. Y. Chou, Appl. Phys. Lett. APPLAB 0003-6951 72, 1205 (1998). 10.1063/1.121014 (Pubitemid 128677843)
- (1998) Applied Physics Letters , vol.72 , Issue.10 , pp. 1205-1207
- Zhuang, L.¹ Guo, L.² Chou, S.Y.³

7
- 0040708652
- JVTBD9 1071-1023,. 10.1116/1.590933
- J. Wang, A. Schablitsky, Z. Yu, W. Wu, and S. Y. Chou, J. Vac. Sci. Technol. B JVTBD9 1071-1023 17, 2957 (1999). 10.1116/1.590933
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 2957
- Wang, J.¹ Schablitsky, A.² Yu, Z.³ Wu, W.⁴ Chou, S.Y.⁵

8
- 0034314809
- Fabrication of quantum point contacts by imprint lithography and transport studies
- DOI 10.1116/1.1319705
- I. Martini, S. Kuhn, M. Kamp, L. Worschech, A. Forchel, D. Eisert, J. Koeth, and R. Sijbesma, J. Vac. Sci. Technol. B JVTBD9 1071-1023 18, 3561 (2000). 10.1116/1.1319705 (Pubitemid 32088256)
- (2000) Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures , vol.18 , Issue.6 , pp. 3561-3563
- Martini, I.¹ Kuhn, S.² Kamp, M.³ Worschech, L.⁴ Forchel, A.⁵ Eisert, D.⁶ Koeth, J.⁷ Sijbesma, R.⁸

9
- 0018543242
- ACCURACY REQUIREMENTS FOR ADJUSTING VARIABLE-SHAPED BEAM SYSTEMS FOR THE PRODUCTION OF SUBMICRON PATTERNS.
- DOI 10.1116/1.570281
- H. J. Binder and P. Hahmann, J. Vac. Sci. Technol. JVSTAL 0022-5355 16, 1723 (1979). 10.1116/1.570281 (Pubitemid 10479364)
- (1979) Journal of vacuum science & technology , vol.16 , Issue.6 , pp. 1723-1725
- Binder, H.J.¹ Hahmann, P.²

10
- 0000934660
- JVTBD9 1071-1023,. 10.1116/1.586984
- K. Hattori, J. Vac. Sci. Technol. B JVTBD9 1071-1023 11, 2346 (1993). 10.1116/1.586984
- (1993) J. Vac. Sci. Technol. B , vol.11 , pp. 2346
- Hattori, K.¹

11
- 0031345933
- JAPNDE 0021-4922,. 10.1143/JJAP.36.7523
- J. Takamatsu, T. Nakasugi, Y. Kato, N. Shimomura, H. Sunaoshi, K. Hattori, K. Nakajima, K. Sugihara, and T. Takigawa, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 36, 7523 (1997). 10.1143/JJAP.36.7523
- (1997) Jpn. J. Appl. Phys., Part 1 , vol.36 , pp. 7523
- Takamatsu, J.¹ Nakasugi, T.² Kato, Y.³ Shimomura, N.⁴ Sunaoshi, H.⁵ Hattori, K.⁶ Nakajima, K.⁷ Sugihara, K.⁸ Takigawa, T.⁹

12
- 0033348295
- JAPNDE 0021-4922,. 10.1143/JJAP.38.7046
- T. Utsumi, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 38, 7046 (1999). 10.1143/JJAP.38.7046
- (1999) Jpn. J. Appl. Phys., Part 1 , vol.38 , pp. 7046
- Utsumi, T.¹

13
- 29044450416
- Performances by the electron optical system of low energy electron beam proximity projection lithography tool with a large scanning field
- DOI 10.1116/1.2062435
- H. Kasahara, T. Shishido, N. Samoto, and N. Shimazu, J. Vac. Sci. Technol. B JVTBD9 1071-1023 23, 2754 (2005). 10.1116/1.2062435 (Pubitemid 41788750)
- (2005) Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures , vol.23 , Issue.6 , pp. 2754-2757
- Kasahara, H.¹ Shishido, T.² Samoto, N.³ Shimazu, N.⁴

14
- 0035751216
- JSTEEW 0914-9244,. 10.2494/photopolymer.14.457
- Y. Hirai, S. Yoshida, A. Okamoto, Y. Tanaka, M. Endo, S. Irie, H. Nakagawa, and M. Sasago, J. Photopolym. Sci. Technol. JSTEEW 0914-9244 14, 457 (2001). 10.2494/photopolymer.14.457
- (2001) J. Photopolym. Sci. Technol. , vol.14 , pp. 457
- Hirai, Y.¹ Yoshida, S.² Okamoto, A.³ Tanaka, Y.⁴ Endo, M.⁵ Irie, S.⁶ Nakagawa, H.⁷ Sasago, M.⁸

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.