Evanescent-wave interferometric nanoscale photolithography using guided-mode resonant gratings

Microelectronic Engineering

Volumn 88, Issue 2, 2011, Pages 170-174

  Bezus, E A ^a,b   Doskolovich, L L ^a,b   Kazanskiy, N L ^a,b  

^a RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

^b SAMARA NATIONAL RESEARCH UNIVERSITY   (Russian Federation)

Author keywords

Evanescent wave; Guided mode resonant grating; Interference pattern; Nanolithography

Indexed keywords

DIFFRACTION ORDERS; EVANESCENT WAVE; FEATURE SIZES; HIGH FREQUENCY HF; HIGH QUALITY; INCIDENT WAVELENGTH; INCIDENT WAVES; INTERFERENCE LITHOGRAPHY; INTERFERENCE PATTERNS; LOW FREQUENCY; MAXWELL'S EQUATIONS; NANOSCALE FEATURES; NANOSCALE PHOTOLITHOGRAPHY; NEAR-FIELD; ORDER OF MAGNITUDE; POTENTIAL APPLICATIONS; RESONANCE CONDITION; RESONANT GRATINGS; RIGOROUS COUPLED WAVE ANALYSIS; SUBWAVELENGTH PERIOD;

DIFFRACTION; DIFFRACTION GRATINGS; ELECTROMAGNETIC WAVE REFLECTION; ELECTROMAGNETIC WAVES; ELECTRON EMISSION; MAXWELL EQUATIONS; NANOLITHOGRAPHY; NANOSTRUCTURED MATERIALS; PHOTOLITHOGRAPHY;

WAVE EQUATIONS;

EID: 78650028502     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2010.10.006     Document Type: Article

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