Nano-scale three dimensional surface relief features using single exposure counter-propagating multiple evanescent waves interference phenomenon

Optics Express

Volumn 16, Issue 18, 2008, Pages 13857-13870

  Murukeshan, Vadakke Matham ^a   Chua, Jeun Kee ^a   Tan, Sia Kim ^b   Lin, Qun Yin ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b Chartered Semiconductor Manufacturing   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELASTIC WAVES; ELECTROMAGNETIC WAVE REFLECTION; PHOTORESISTS; REFRACTIVE INDEX; WAVE PROPAGATION;

CELLULAR AUTOMATA ALGORITHMS; ILLUMINATION SOURCES; INTERFERENCE LITHOGRAPHY; INTERFERENCE PHENOMENA; PHOTORESIST PROFILES; POSITIVE-TONE RESISTS; THREE-DIMENSIONAL SURFACE; TOTAL INTERNAL REFLECTIONS;

NANOTECHNOLOGY;

ALGORITHM; ARTICLE; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; MATERIALS; METHODOLOGY; NANOTECHNOLOGY; REFRACTOMETRY; SURFACE PROPERTY; THEORETICAL MODEL;

ALGORITHMS; COMPUTER SIMULATION; COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; MANUFACTURED MATERIALS; MODELS, THEORETICAL; NANOTECHNOLOGY; REFRACTOMETRY; SURFACE PROPERTIES;

EID: 51149124300     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.013857     Document Type: Article

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