Effect of TiO2 buffer layer thickness on properties of ITZO films deposited on flexible substrate

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 1, 2010, Pages

  Kwon, S H ^a   Kang, Y M ^a   Cho, Y R ^a   Kim, S H ^b   Song, P K ^a  

^a Pusan National University   (South Korea)

^b Inha University   (South Korea)

Author keywords

Buffer layer; Flexible display; In Sn Zn O; Reactive sputtering

Indexed keywords

AMORPHOUS STRUCTURES; BUFFER LAYER THICKNESS; FLEXIBLE SUBSTRATE; FLOW RATIOS; IN-SN-ZN-O; MAGNETRON CO-SPUTTERING; PET SUBSTRATE; RF REACTIVE SPUTTERING; ROOM TEMPERATURE; TIO;

AMORPHOUS FILMS; BUFFER LAYERS; MAGNETRONS; MECHANICAL PROPERTIES; OPTICAL MICROSCOPY; REACTIVE SPUTTERING; SPUTTER DEPOSITION; SUBSTRATES; TIN; ZINC;

FLEXIBLE DISPLAYS;

EID: 78649968701     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.08.019     Document Type: Article

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