Characteristics of IZSO films deposited by a co-sputtering system

Metals and Materials International

Volumn 13, Issue 5, 2007, Pages 399-402

  Lee, Jung Rak ^a   Kim, Do Geun ^b   Lee, Gun Hwan ^b   Park, Yong Ho ^a   Song, Pung Keun ^a  

^a Pusan National University   (South Korea)

^b Korea Institute of Material Science   (South Korea)

Author keywords

Co sputtering; Electrical properties; In Zn Sn O films; Magnetron sputtering; TCO

Indexed keywords

CATHODES; ELECTRIC PROPERTIES; HALL MOBILITY; HOLE MOBILITY; II-VI SEMICONDUCTORS; MAGNETRON SPUTTERING; OXIDE MINERALS; SPUTTERING; ZINC OXIDE;

COSPUTTERING; IN-ZN-SN-O; IONIZED IMPURITY SCATTERING; MAGNETRON CO-SPUTTERING; POWER RATIO; RF DISCHARGE; RF-POWER; SUBSTRATE HEATING;

COBALT COMPOUNDS;

EID: 35948974309     PISSN: 15989623     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF03027875     Document Type: Article

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