메뉴 건너뛰기




Volumn 107, Issue 8, 2010, Pages

Properties of inductively coupled rf Ar/ H2 plasmas: Experiment and global model

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON DENSITIES; ELECTRON ENERGY DISTRIBUTIONS; ELECTRON ENERGY PROBABILITY FUNCTIONS; GLOBAL MODELS; HIGH ENERGY; HIGH-ENERGY ELECTRON; HYDROGEN ATOMS; HYDROGEN DISCHARGE; INDUCTIVELY-COUPLED; ION CURRENTS; ION MASS; LOW ENERGIES; MAXWELLIAN DISTRIBUTION; MODEL RESULTS; MOLECULAR HYDROGEN; PLASMA PARAMETER; TOTAL PRESSURE; TWO-TEMPERATURE;

EID: 77952417210     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3345084     Document Type: Article
Times cited : (63)

References (43)
  • 8
    • 27144524898 scopus 로고    scopus 로고
    • Hydrogen plasma effects on ultralow-k porous SiCOH dielectrics
    • DOI 10.1063/1.2060935, 074502
    • A. Grill, A. V. Sternhagen, D. Neumayer, and V. Patel, J. Appl. Phys. JAPIAU 0021-8979 98, 074502 (2005). 10.1063/1.2060935 (Pubitemid 41502003)
    • (2005) Journal of Applied Physics , vol.98 , Issue.7 , pp. 1-7
    • Grill, A.1    Sternhagen, V.2    Neumayer, D.3    Patel, V.4
  • 9
    • 32844467912 scopus 로고    scopus 로고
    • On determination of the degree of dissociation of hydrogen in non-equilibrium plasmas by means of emission spectroscopy: I. the collision-radiative model and numerical experiments
    • DOI 10.1088/0963-0252/15/1/020, PII S0963025206158442
    • B. P. Lavrov, A. V. Pipa, and J. Ropcke, Plasma Sources Sci. Technol. PSTEEU 0963-0252 15, 135 (2006). 10.1088/0963-0252/15/1/020 (Pubitemid 43254137)
    • (2006) Plasma Sources Science and Technology , vol.15 , Issue.1 , pp. 135-146
    • Lavrov, B.P.1    Pipa, A.V.2    Ropcke, J.3
  • 10
    • 32844456659 scopus 로고    scopus 로고
    • On determination of the degree of dissociation of hydrogen in non-equilibrium plasmas by means of emission spectroscopy: II. Experimental verification
    • DOI 10.1088/0963-0252/15/1/021, PII S096302520615848X
    • B. P. Lavrov, N. Lang, A. V. Pipa, and J. Ropcke, Plasma Sources Sci. Technol. PSTEEU 0963-0252 15, 147 (2006). 10.1088/0963-0252/15/1/021 (Pubitemid 43254138)
    • (2006) Plasma Sources Science and Technology , vol.15 , Issue.1 , pp. 147-155
    • Lavrov, B.P.1    Lang, N.2    Pipa, A.V.3    Ropcke, J.4
  • 11
    • 33750601896 scopus 로고    scopus 로고
    • Determination of the degree of dissociation in an inductively coupled hydrogen plasma using optical emission spectroscopy and laser diagnostics
    • DOI 10.1088/0963-0252/15/4/005, PII S0963025206232316, 005
    • M. Abdel-Rahman, V. Schulz-von der Gathen, T. Gans, K. Niemi, and H. F. Dobele, Plasma Sources Sci. Technol. PSTEEU 0963-0252 15, 620 (2006). 10.1088/0963-0252/15/4/005 (Pubitemid 44679406)
    • (2006) Plasma Sources Science and Technology , vol.15 , Issue.4 , pp. 620-626
    • Abdel-Rahman, M.1    Schulz-Von Der Gathen, V.2    Gans, T.3    Niemi, K.4    Dobele, H.F.5
  • 12
    • 0024765308 scopus 로고
    • JPAPBE 0022-3727. 10.1088/0022-3727/22/11/017
    • J. Loureiro and C. M. Ferreira, J. Phys. D JPAPBE 0022-3727 22, 1680 (1989). 10.1088/0022-3727/22/11/017
    • (1989) J. Phys. D , vol.22 , pp. 1680
    • Loureiro, J.1    Ferreira, C.M.2
  • 20
    • 23844515030 scopus 로고    scopus 로고
    • Effect of discharge voltage on capacitively coupled, parallel plate rf hydrogen plasmas
    • DOI 10.1088/0963-0252/14/3/007, PII S0963025205985514
    • P. Diomede, M. Capitelli, and S. Longo, Plasma Sources Sci. Technol. PSTEEU 0963-0252 14, 459 (2005). 10.1088/0963-0252/14/3/007 (Pubitemid 41165125)
    • (2005) Plasma Sources Science and Technology , vol.14 , Issue.3 , pp. 459-466
    • Diomede, P.1    Capitelli, M.2    Longo, S.3
  • 21
    • 34848854793 scopus 로고    scopus 로고
    • Capacitively coupled radio-frequency hydrogen discharges: The role of kinetics
    • DOI 10.1063/1.2779268
    • L. Marques, J. Jolly, and L. L. Alves, J. Appl. Phys. JAPIAU 0021-8979 102, 063305 (2007). 10.1063/1.2779268 (Pubitemid 47508909)
    • (2007) Journal of Applied Physics , vol.102 , Issue.6 , pp. 063305
    • Marques, L.1    Jolly, J.2    Alves, L.L.3
  • 23
    • 0001890931 scopus 로고
    • edited by M. Francombe and J. Vossen, (Academic, New York)
    • M. A. Lieberman and R. A. Gottscho, in Physics of Thin Films edited by, M. Francombe, and, J. Vossen, (Academic, New York, 1994), Vol. 18, p. 1.
    • (1994) Physics of Thin Films , vol.18 , pp. 1
    • Lieberman, M.A.1    Gottscho, R.A.2
  • 26
    • 4744359310 scopus 로고    scopus 로고
    • JPAPBE 0022-3727. 10.1088/0022-3727/37/18/016
    • N. Laidani, R. Bartali, P. Tosi, and M. Anderle, J. Phys. D JPAPBE 0022-3727 37, 2593 (2004). 10.1088/0022-3727/37/18/016
    • (2004) J. Phys. D , vol.37 , pp. 2593
    • Laidani, N.1    Bartali, R.2    Tosi, P.3    Anderle, M.4
  • 28
    • 34250930966 scopus 로고
    • ZEPYAA 0044-3328. 10.1007/BF01773007
    • M. J. Druyvesteyn, Z. Phys. ZEPYAA 0044-3328 64, 781 (1930). 10.1007/BF01773007
    • (1930) Z. Phys. , vol.64 , pp. 781
    • Druyvesteyn, M.J.1
  • 29
    • 0033341723 scopus 로고    scopus 로고
    • 4 discharges
    • DOI 10.1088/0963-0252/8/4/305
    • T. Kimura and K. Ohe, Plasma Sources Sci. Technol. PSTEEU 0963-0252 8, 553 (1999). 10.1088/0963-0252/8/4/305 (Pubitemid 30514839)
    • (1999) Plasma Sources Science and Technology , vol.8 , Issue.4 , pp. 553-560
    • Kimura, T.1    Ohe, K.2
  • 32
    • 34247540867 scopus 로고    scopus 로고
    • Oxygen discharges diluted with argon: Dissociation processes
    • DOI 10.1088/0963-0252/16/2/025, PII S0963025207368424, 025
    • J. T. Gudmundsson and E. G. Thorsteinsson, Plasma Sources Sci. Technol. PSTEEU 0963-0252 16, 399 (2007). 10.1088/0963-0252/16/2/025 (Pubitemid 46646763)
    • (2007) Plasma Sources Science and Technology , vol.16 , Issue.2 , pp. 399-412
    • Gudmundsson, J.T.1    Thorsteinsson, E.G.2
  • 34
    • 0035870956 scopus 로고    scopus 로고
    • JAPIAU 0021-8979. 10.1063/1.1354652
    • T. Kimura and K. Ohe, J. Appl. Phys. JAPIAU 0021-8979 89, 4240 (2001). 10.1063/1.1354652
    • (2001) J. Appl. Phys. , vol.89 , pp. 4240
    • Kimura, T.1    Ohe, K.2
  • 37
    • 0029304515 scopus 로고
    • PSTEEU 0963-0252. 10.1088/0963-0252/4/2/012
    • W. G. Graham, Plasma Sources Sci. Technol. PSTEEU 0963-0252 4, 281 (1995). 10.1088/0963-0252/4/2/012
    • (1995) Plasma Sources Sci. Technol. , vol.4 , pp. 281
    • Graham, W.G.1
  • 38
    • 36749117426 scopus 로고
    • JCPSA6 0021-9606. 10.1063/1.1682333
    • J. D. Walker, Jr. and R. M. St John, J. Chem. Phys. JCPSA6 0021-9606 61, 2394 (1974). 10.1063/1.1682333
    • (1974) J. Chem. Phys. , vol.61 , pp. 2394
    • Walker Jr., J.D.1    St John, R.M.2
  • 39
    • 49349132755 scopus 로고
    • CMPHC2 0301-0104. 10.1016/0301-0104(77)87067-5
    • G. R. Möhlmann, F. J. DeHeer, and L. Los, Chem. Phys. CMPHC2 0301-0104 25, 103 (1977). 10.1016/0301-0104(77)87067-5
    • (1977) Chem. Phys. , vol.25 , pp. 103
    • Möhlmann, G.R.1    Deheer, F.J.2    Los, L.3
  • 41
    • 33750580461 scopus 로고    scopus 로고
    • Basics of plasma spectroscopy
    • DOI 10.1088/0963-0252/15/4/S01, PII S0963025206124974, S01
    • U. Fanz, Plasma Sources Sci. Technol. PSTEEU 0963-0252 15, S137 (2006). 10.1088/0963-0252/15/4/S01 (Pubitemid 44679438)
    • (2006) Plasma Sources Science and Technology , vol.15 , Issue.4
    • Fantz, U.1
  • 42
    • 0032136550 scopus 로고    scopus 로고
    • PSTEEU 0963-0252. 10.1088/0963-0252/7/3/011
    • J. T. Gudmundsson, Plasma Sources Sci. Technol. PSTEEU 0963-0252 7, 330 (1998). 10.1088/0963-0252/7/3/011
    • (1998) Plasma Sources Sci. Technol. , vol.7 , pp. 330
    • Gudmundsson, J.T.1
  • 43


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.