Hydrophobic to hydrophilic transition of HF-treated Si surface during Langmuir-Blodgett film deposition

Chemical Physics Letters

Volumn 500, Issue 1-3, 2010, Pages 90-95

  Bal, J K ^a   Kundu, S ^b   Hazra, S ^a  

^a SAHA INSTITUTE OF NUCLEAR PHYSICS   (India)

^b S N BOSE NATIONAL CENTRE FOR BASIC SCIENCES   (India)

Author keywords

[No Author keywords available]

Indexed keywords

COMPLETE OXIDATION; COVALENT BONDING; LANGMUIR-BLODGETT FILM DEPOSITION; PARTIAL OXIDATIONS; PURE WATER; SI ATOMS; SI SURFACES; SUBPHASES;

HYDROPHILICITY; HYDROPHOBICITY; LANGMUIR BLODGETT FILMS; OXIDATION; SILICON;

FILM GROWTH;

EID: 78649913751     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cplett.2010.10.004     Document Type: Article

References (50)

1. J.A. Zasadzinski, R. Viswanathan, L. Madsen, J. Garnaes, and D.K. Schwartz Science 263 1994 1726
2. J.K. Bal, and S. Hazra Phys. Rev. B 79 2009 155412
3. V. Derycke, P.G. Soukiassian, F. Amy, Y.J. Chabal, M.D. D'Angelo, H.B. Enriquez, and M.G. Silly Nat. Mater. 2 2003 253
4. H. Ubara, T. Imura, and A. Hiraki Solid State Commun. 50 1984 673
5. E. Yablonovitch, D.L. Allara, C.C. Chang, T. Gmitter, and T.B. Bright Phys. Rev. Lett. 57 1986 249
6. V.A. Burrows, Y.J. Chabal, G.S. Higashi, K. Raghavachari, and S.B. Christman Appl. Phys. Lett. 53 1988 998
7. V.A. Shchukin, and D. Bimberg Rev. Mod. Phys. 71 1999 1125
8. F. Okorn-Schmidt IBM J. Res. Dev. 43 1999 351
9. X.G. Zhang Electrochemistry of Silicon and Its Oxide 2004 Kluwer Academic New York
10. C.-Y. Ruan, V.A. Lobastov, F. Vigliotti, S. Chen, and A.H. Zewail Science 304 2004 80
11. P.L. Silvestrelli, F. Toigo, and F. Ancilotto J. Phys. Chem. B 110 2006 12022
12. J.K. Bal, S. Kundu, and S. Hazra Phys. Rev. B 81 2010 045404
13. K.B. Blodgett, and I. Langmuir Phys. Rev. 51 1937 964
14. M.C. Petty Langmuir-Blodgett Films, An Introduction 1996 Cambridge University New York
15. D.K. Schwartz Surf. Sci. Rep. 27 1997 245
16. J.K. Basu, S. Hazra, and M.K. Sanyal Phys. Rev. Lett. 82 1999 4675
17. J.K. Basu, and M.K. Sanyal Phys. Rep. 363 2002 1
18. S. Kundu, A. Datta, and S. Hazra Chem. Phys. Lett. 405 2005 282
19. I.K. Robinson, and D.J. Tweet Rep. Prog. Phys. 55 1992 599
20. J. Daillant, A. Gibaud, X-ray and Neutron Reflectivity: Principles and Applications 1999 Springer Paris
21. S. Morita, R. Wiesendanger, E. Meyer, Noncontact Atomic Force Microscopy 2002 Springer Heidelberg
22. K.L. Mittal (Ed.), Contact Angle, Wettability and Adhesion, VSP BV, Urecht, Netherlands, 1993.
23. J.F. Watts, and J. Wolstenholme An Introduction to Surface Analysis by XPS and AES 2003 Wiley
24. T. Strother, W. Cai, X. Zhao, R.J. Hamers, and L.M. Smith J. Am. Chem. Soc. 122 2000 1205
25. K.-Y. Tse, B.M. Nichols, W. Yang, J.E. Butler, J.N. Russell, and R.J. Hamers J. Phys. Chem. B 109 2005 8523
26. M. Dai, Y. Wang, J. Kwon, M.D. Halls, and Y.J. Chabal Nat. Mater. 8 2009 825
27. R. Boukherroub Curr. Opin. Solid State Mater. Sci. 9 2005 66
28. X. Zhang, E. Garfunkel, Y.J. Chabal, S.B. Christman, and E.E. Chaban Appl. Phys. Lett. 79 2001 4051
29. S. Rivillon, F. Amy, Y.J. Chabal, and M.M. Frank Appl. Phys. Lett. 85 2004 2583
30. M. Niwano, J. Kageyama, K. Kurita, K. Kinashi, I. Takahashi, and N. Miyamoto J. Appl. Phys. 76 1994 2157
31. T. Ohmi J. Electrochem. Soc. 143 1996 2957
32. E.S. Snow, G.G. Jernigan, and P.M. Cambell Appl. Phys. Lett. 76 2000 1782
33. Y.J. Chabal, and S.B. Christman Phys. Rev. B 29 1984 6974
34. M. Ranke, and Y.R. Xing Surf. Sci. 157 1985 339
35. E. Kondoh, M.R. Baklanov, F. Jonckx, and K. Maex Mater. Sci. Semicond. Process. 1 1998 107
36. T. Hanada, and M. Kawai Vacuum 41 1990 650
37. D. Graf, M. Grundner, D. Muhlhoff, and M. Dellith J. Appl. Phys. 69 1991 7620
38. S. Xu, P. Xu, M. Ji, X. Liu, M. Ma, J. Zhu, and Y. Zhang J. Mater. Sci. Technol. 9 1993 437
39. N. Takano, N. Hosoda, T. Yamada, and T. Osaka Electrochim. Acta 44 1999 3743
40. J.K. Bal, and S. Hazra Phys. Rev. B 75 2007 205411
41. I. Horcas, R. Fernndez, J.M. Gwez-Rodrguez, J. Colchero, J. Gomez-Herrero, and A.M. Baro Rev. Sci. Instrum. 78 2007 013705
42. L.G. Parratt Phys. Rev. 95 1954 359
43. D. Graf, M. Grundner, and R. Chulz J. Vac. Sci. Technol. A 7 1989 808
44. J.K. Bal, and S. Hazra Defect Diffus. Forum 297-301 2010 1133
45. D.J. Michalak, S.R. Amy, D. Aureau, M. Dai, A. Esteve, and Y.J. Chabal Nat. Mater. 9 2010 266
46. A. Hiraki Surf. Sci. Rep. 3 1983 357
47. J.K. Bal, and S. Hazra Phys. Rev. B 79 2009 155405
48. S. Adachi, T. Arai, and K. Kobayashi J. Appl. Phys. 80 1996 5422
49. F.J. Himpsel, F.R. McFeely, A. Taleb-Ibrahimi, J.A. Yarmoff, and G. Hollinger Phys. Rev. B 38 1988 6084
50. A. Pasquarello, M.S. Hybertsen, and R. Car Phys. Rev. B 53 1996 10542