Two complementary methods to characterize long range proximity effects due to develop loading

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7823, Issue PART 1, 2010, Pages

  Sundberg, Linda K ^a   Wallraff, Greg M ^a   Friz, Alexander M ^a   Davis, Blake ^a   Zweber, Amy E ^b   Lovchik, Robert ^c   Delamarche, Emmanuel ^c   Senna, Tasuku ^d   Komizo, Toru ^e   Hinsberg, William D ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b IBM   (United States)

^c IBM RESEARCH ZURICH   (Switzerland)

^d Toppan Photomasks Inc   (United States)

^e TOPPAN PRINTING CO LTD   (Japan)

Author keywords

CDU; Chemical flare; Density effects; Develop; Develop loading; Flowcell; Fogging; PDMS

Indexed keywords

CDU; DENSITY EFFECTS; DEVELOP; DEVELOP LOADING; FLOW CELLS; FOGGING; PDMS;

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; FOG DISPERSAL; MICROCHANNELS; PHOTOMASKS;

LOADING;

EID: 78649888070     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.864336     Document Type: Conference Paper

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