Improvement of CD controllability in development process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 II, Issue , 2003, Pages 1353-1365

  Kyoda, Hideharu ^a   Okouchi, Atsushi ^a   Takeguchi, Hirofumi ^a   Kim, Hyun Woo ^a   Yamamoto, Taro ^a   Yoshihara, Kosuke ^a  

^a TOKYO ELECTRON LTD   (Japan)

Author keywords

By product; Chemically amplified resists; Critical dimension; Development process; Resist dissolution

Indexed keywords

CHEMICALLY AMPLIFIED RESIST; CRITICAL DIMENSION CONTROLLABILITY;

ACRYLICS; DISSOLUTION; HYDROPHILICITY; HYDROPHOBICITY; MASKS; OPTIMIZATION; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SOLUBILITY; THICKNESS MEASUREMENT; THIN FILMS;

PHOTORESISTS;

EID: 0141833922     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485063     Document Type: Conference Paper

References (6)

1. Eishi Shiobara, Daisuke Kawamura, Kento Matsunaga, Yasunobu Onishi, "Dependence of Resist Profile on Exposed Area Ratio," vol 4345, pp628-636, SPIE 2001
2. Hiroko Nakamura, Tatsuhiko Ema, Kei Hayasaki, Shinichi Ito and Katsuya Okumura, "The Effect of Mixing Development Method on CD Uniformity," Microprocess and Nanotechnology '99, Digest of papers, P156, 1999
3. Sean D. Burns, Allen D. Gardinar, V.J. Kurkonis, Paula M. Wetmore, Jodie Lutkenhaus, Gerard M. Schmid, Lewis W. Flanagin and C. Grant Wilson, "Understanding Nonlinear Dissolution Rate in Photoresists," vol. 4345, pp37-49, SPIE 2001
4. Shinichi Ito, Kei Hayasaki, Hiroko Nakamura, "Dissolution Performance of Device Pattern with Low-Impact Development," vol. 4345, pp665-672, SPIE 2001
5. Kazuo Sakamoto, Akira Nishiya, Kentaro Yamamura, Takahisa Otsuka, "Novel Develop Method to Improve Critical Dimension Control," vol.4690, pp782-792, SPIE 2002
6. Yoshifumi Takai, J. Mulhall, Kosuke Yoshihara, Hideharu Kyoda, Hirofumi Takeguchi, "Behavior and Control of Resist Dissolution in the Development Process," vol. 4690, pp929-935, SPIE 2002