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Volumn 6923, Issue , 2008, Pages
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Characterization of array CD uniformity with respect to pattern density in 193nm dry photolithography
a
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Author keywords
193nm; CDU; Chemical flare; Mask transmission; Photolithography
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Indexed keywords
DATA STORAGE EQUIPMENT;
OPTICAL INSTRUMENTS;
PHOTORESISTORS;
SURFACE TREATMENT;
193NM;
BAKE TEMPERATURES;
CD UNIFORMITIES;
CDU;
CRITICAL DIMENSION UNIFORMITIES;
EFFECT OF CHEMICALS;
PATTERN DENSITIES;
PHOTOACID GENERATORS;
RESIST PROCESSING;
PHOTORESISTS;
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EID: 57349137702
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.773316 Document Type: Conference Paper |
Times cited : (4)
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References (4)
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