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Volumn 6923, Issue , 2008, Pages

Characterization of array CD uniformity with respect to pattern density in 193nm dry photolithography

Author keywords

193nm; CDU; Chemical flare; Mask transmission; Photolithography

Indexed keywords

DATA STORAGE EQUIPMENT; OPTICAL INSTRUMENTS; PHOTORESISTORS; SURFACE TREATMENT;

EID: 57349137702     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.773316     Document Type: Conference Paper
Times cited : (4)

References (4)
  • 1
    • 24644462179 scopus 로고    scopus 로고
    • A new long range proximity effect in chemically amplified photoresist processes: Chemical flare
    • T. Brunner et al., "A new long range proximity effect in chemically amplified photoresist processes: "chemical flare"," Proc. SPIE, 5753, pp. 261-268, 2005.
    • (2005) Proc. SPIE , vol.5753 , pp. 261-268
    • Brunner, T.1
  • 2
    • 0034768843 scopus 로고    scopus 로고
    • Dependence of resist profile on exposed area ratio
    • E. Shiobara et al., "Dependence of resist profile on exposed area ratio," Proc. SPIE, 4345, pp. 628-636, 2001.
    • (2001) Proc. SPIE , vol.4345 , pp. 628-636
    • Shiobara, E.1
  • 3
    • 35148834817 scopus 로고    scopus 로고
    • Characterization of Photoacid Redeposition in 193mn Photoresists
    • T. Wallow et al., "Characterization of Photoacid Redeposition in 193mn Photoresists," Proc. SPIE, 6519, 2007.
    • (2007) Proc. SPIE , vol.6519
    • Wallow, T.1
  • 4
    • 33745626202 scopus 로고    scopus 로고
    • Numerical Analyses of the Roles of Gas Phase and Liquid Phase UV Photochemistry in Conventional and Immersion 193nm Lithography
    • W. Hinsberg, and F.A. Houle, "Numerical Analyses of the Roles of Gas Phase and Liquid Phase UV Photochemistry in Conventional and Immersion 193nm Lithography," Proc SPIE, 6153, 2006.
    • (2006) Proc SPIE , vol.6153
    • Hinsberg, W.1    Houle, F.A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.