Chemical flare long range proximity effects in photomask manufacturing with chemically amplified resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 II, Issue , 2006, Pages

  Sullivan, Daniel ^a   Okawa, Yusuke ^b   Sugawara, Kazuhiko ^b   Benes, Zdenek ^a   Kotani, Jun ^b  

^a IBM   (United States)

^b Toppan Photomasks Inc   (United States)

Author keywords

Chemically amplified resist; Critical dimension uniformity; Fogging effect; Loading effect; Photoresist; Proximity effect

Indexed keywords

CHEMICALLY AMPLIFIED RESIST; CRITICAL DIMENSION UNIFORMITY; FOGGING EFFECTS; LOADING EFFECTS; PHOTORESIST; PROXIMITY EFFECTS;

CHEMICAL MODIFICATION; COATING TECHNIQUES; OPTIMIZATION; PHOTOLITHOGRAPHY;

MASKS;

EID: 33846608259     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.686732     Document Type: Conference Paper

References (9)

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