High flow rate development: Process optimization using Megasonic Immersion Development (MID)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 1, 2004, Pages 220-233

  Courboin, Daniel ^a   Choi, Jong Woo ^a   Jung, Sang Hyun ^a   Baek, Seung Hee ^a   Kim, Lee Ju ^a  

^a DUPONT COMPANY   (United States)

Author keywords

Chemically Amplified Resist; Developer Concentration; Developer Temperature; Megasonic; Microloading; Novolak Resist; Photomask

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAMS; LITHOGRAPHY; LOADING; MASKS; MATHEMATICAL MODELS; OPTIMIZATION; SCANNING ELECTRON MICROSCOPY; THERMAL EFFECTS; VECTORS;

CHEMICALLY AMPLIFIED RESISTS (CAR); DEVELOPER CONCENTRATION; DEVELOPER TEMPERATURE; MEGASONIC; MICROLOADING; NOVOLAK RESIST; PHOTOMASKS;

PHOTORESISTS;

EID: 19844367631     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.569774     Document Type: Conference Paper

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