Effects of additive gases and plasma post-treatment on electrical properties and optical transmittance of ZnO thin films

Thin Solid Films

Volumn 519, Issue 5, 2010, Pages 1568-1572

  Bang, Jung Hwan ^a   Uhm, Hyun Seok ^a   Kim, Won ^a   Park, Jin Seok ^a  

^a Hanyang University   (South Korea)

Author keywords

Crystal quality; In situ gas addition; Plasma post treatment; Resistivity; Transmittance; Zinc oxide(ZnO)

Indexed keywords

CRYSTAL QUALITIES; IN-SITU; PLASMA POST-TREATMENT; RESISTIVITY; TRANSMITTANCE;

ARGON; ELECTRIC PROPERTIES; FILM GROWTH; GASES; HYDROGEN; INJECTION (OIL WELLS); METALLIC FILMS; OPTICAL PROPERTIES; OXYGEN; OXYGEN VACANCIES; PASSIVATION; PLASMA APPLICATIONS; PLASMAS; SUPERCONDUCTING FILMS; THIN FILM TRANSISTORS; THIN FILMS; VAPOR DEPOSITION; ZINC;

ZINC OXIDE;

EID: 78649731467     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.08.088     Document Type: Conference Paper

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