Modification of electrical conductivity in RF magnetron sputtered ZnO films by low-energy hydrogen ion implantation

Current Applied Physics

Volumn 6, Issue 3, 2006, Pages 495-498

  Kennedy, J ^a,b   Markwitz, A ^a,b   Li, Z ^c   Gao, W ^c   Kendrick, C ^d   Durbin, S M ^d   Reeves, R ^d  

^a GNS SCIENCE   (New Zealand)

^b VICTORIA UNIVERSITY OF WELLINGTON   (New Zealand)

^c UNIVERSITY OF AUCKLAND   (New Zealand)

^d UNIVERSITY OF CANTERBURY   (New Zealand)

Author keywords

ERDA; Hydrogen; Ion implantation; SEM; XRD; ZnO

Indexed keywords

ELECTRIC CONDUCTIVITY; HYDROGEN; ION IMPLANTATION; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

ERDA; LOW-ENERGY HYDROGEN IMPLANTATION; XRD; ZNO;

THIN FILMS;

EID: 33744541791     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2005.11.046     Document Type: Article

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