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Volumn 19, Issue 12, 2010, Pages 1446-1452
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Improved microwave plasma cavity reactor for diamond synthesis at high-pressure and high power density
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Author keywords
Diamond synthesis; Enhanced growth; Microwave plasma CVD; Reactor design
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Indexed keywords
ABSORBED POWER;
DIAMOND SYNTHESIS;
DISCHARGE POSITION;
ENHANCED GROWTH;
FREE-STANDING DIAMOND FILMS;
GAS CHEMISTRY;
HIGH POWER DENSITY;
HIGH PRESSURE;
HIGH PURITY;
LOWER PRESSURES;
METHANE CONCENTRATIONS;
MICROWAVE CAVITY;
MICROWAVE DISCHARGE;
MICROWAVE PLASMA;
MICROWAVE PLASMA CAVITY;
MICROWAVE PLASMA CVD;
OPERATING PRESSURE;
OPTICAL MEASUREMENT;
PLASMA REACTORS;
POLYCRYSTALLINE DIAMOND FILMS;
POWER DENSITIES;
PRESSURE REGIME;
PROCESS OPTIMIZATION;
REACTOR DESIGNS;
SILICON SUBSTRATES;
SUBSTRATE TEMPERATURE;
DEPOSITION RATES;
DIAMOND FILMS;
DIAMONDS;
ELECTRIC DISCHARGES;
METHANATION;
METHANE;
MICROWAVES;
OPTICAL DATA PROCESSING;
OPTICAL FILMS;
OPTIMIZATION;
PLASMA APPLICATIONS;
PLASMAS;
SUBSTRATES;
SYNTHETIC DIAMONDS;
HIGH PRESSURE EFFECTS IN SOLIDS;
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EID: 78649632302
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/j.diamond.2010.07.005 Document Type: Article |
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Times cited : (65)
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References (22)
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