메뉴 건너뛰기




Volumn 6, Issue 9, 1997, Pages 1097-1105

An experimental study of high pressure synthesis of diamond films using a microwave cavity plasma reactor

Author keywords

Diamond films; Microwave reactor; Plasma processing

Indexed keywords


EID: 0000659175     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(97)00018-6     Document Type: Article
Times cited : (49)

References (31)
  • 10
    • 0043258108 scopus 로고
    • PhD Dissertation, Michigan State University
    • J. Zhang, PhD Dissertation, Michigan State University, 1993.
    • (1993)
    • Zhang, J.1
  • 20
    • 0042255734 scopus 로고
    • PhD Dissertation, Michigan State University
    • G. King, PhD Dissertation, Michigan State University, 1994.
    • (1994)
    • King, G.1
  • 27
    • 0043258097 scopus 로고    scopus 로고
    • private communication from lecture notes
    • J. Angus, private communication from lecture notes.
    • Angus, J.1
  • 28
    • 0042756968 scopus 로고
    • Precision Microwave Applicators and Systems for Plasma and Material Processing
    • W.A. Sutton, M.H. Brooks, I.J. Chabinsky (Eds.) Material Res. Society
    • J. Asmussen, R. Garard, Precision Microwave Applicators and Systems for Plasma and Material Processing, in: W.A. Sutton, M.H. Brooks, I.J. Chabinsky (Eds.), Microwave Processing of Materials, Material Res. Society 124 (1990).
    • (1990) Microwave Processing of Materials , vol.124
    • Asmussen, J.1    Garard, R.2
  • 29
    • 0009559923 scopus 로고
    • Microwave Plasma Disk Processing Machine
    • O.A Popov (Ed.) Noyes, New Jersey
    • J. Asmussen, Microwave Plasma Disk Processing Machine, in: O.A Popov (Ed.), High Density Plasma Sources, Noyes, New Jersey, 1995, pp. 251-311.
    • (1995) High Density Plasma Sources , pp. 251-311
    • Asmussen, J.1
  • 30
    • 0041755067 scopus 로고    scopus 로고
    • Ion generating apparatus and method for the use thereof, U.S. Patent No. 4,507,588 (26 March 1985)
    • J. Asmussen, J. Root, Ion generating apparatus and method for the use thereof, U.S. Patent No. 4,507,588 (26 March 1985).
    • Asmussen, J.1    Root, J.2
  • 31
    • 0042756969 scopus 로고    scopus 로고
    • Method for treating a surface with a microwave plasma and improved apparatus, U.S. Patent No. 4 585 688 (29 April 1986)
    • J. Asmussen, D.K. Reinhard, Method for treating a surface with a microwave plasma and improved apparatus, U.S. Patent No. 4 585 688 (29 April 1986).
    • Asmussen, J.1    Reinhard, D.K.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.