Microcrystalline diamond growth in presence of argon in millimeter-wave plasma-assisted CVD reactor

Diamond and Related Materials

Volumn 17, Issue 7-10, 2008, Pages 1055-1061

  Vikharev, A L ^a   Gorbachev, A M ^a   Kozlov, A V ^a   Radishev, D B ^a   Muchnikov, A B ^a  

^a INSTITUTE OF APPLIED PHYSICS   (Russian Federation)

Author keywords

Diamond growth and characterization; Enhanced growth; Millimeter wave; Plasma CVD reactor

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; DIAMONDS; INERT GASES; NONMETALS; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PULSED LASER DEPOSITION;

CVD REACTORS; DIAMOND GROWTH AND CHARACTERIZATION; ENHANCED GROWTH; MICROCRYSTALLINE DIAMOND; MILLIMETER WAVE; MILLIMETER WAVES; PLASMA CVD REACTOR;

ARGON;

EID: 48849099971     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.01.050     Document Type: Article

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