Simulation of microwave plasmas concentrated on the top surface of a diamond substrate with finite thickness

Diamond and Related Materials

Volumn 15, Issue 9, 2006, Pages 1383-1388

  Yamada, Hideaki ^a   Chayahara, Akiyoshi ^a   Mokuno, Yoshiaki ^a   Horino, Yuji ^a   Shikata, Shinichi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

CVD; Microwave; Plasma simulation and modeling; Single crystal diamond

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC POWER SYSTEMS; MORPHOLOGY; PLASMA APPLICATIONS; SUBSTRATES; SURFACE PROPERTIES;

PLASMA SIMULATION AND MODELING; SINGLE CRYSTAL DIAMOND;

DIAMONDS;

EID: 33746779424     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.10.018     Document Type: Article

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