Diamond films grown by millimeter wave plasma-assisted CVD reactor

Diamond and Related Materials

Volumn 15, Issue 4-8, 2006, Pages 502-507

  Vikharev, A L ^a   Gorbachev, A M ^a   Kozlov, A V ^a   Koldanov, V A ^a   Litvak, A G ^a   Ovechkin, N M ^a   Radishev, D B ^a   Bykov, Yu V ^a   Caplan, M ^b  

^a INSTITUTE OF APPLIED PHYSICS   (Russian Federation)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

CVD; Diamond growth and characterization; Microwave plasma; Millimeter waves; Reactor design

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; FILM GROWTH; GYROTRONS; MICROWAVES; MILLIMETER WAVE DEVICES; NATURAL FREQUENCIES; PLASMAS;

DIAMOND GROWTH AND CHARACTERIZATION; MICROWAVE PLASMA; POLYCRYSTALLINE DIAMOND FILMS; REACTOR DESIGN;

DIAMOND FILMS;

EID: 33745277067     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.10.044     Document Type: Article

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