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Volumn 176, Issue 1, 2011, Pages 1-7

Influence of substrate temperature on the materials properties of reactive DC magnetron sputtered Ti/TiN multilayered thin films

(4) Subramanian, B a Ananthakumar, R a Vidhya, V S a Jayachandran, M a

a CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE (India)

Author keywords

Hard coatings; Multilayers; Sputtering; Thin films

Indexed keywords

FILM PREPARATION; HARD COATINGS; MAGNETRON SPUTTERING; MATERIALS PROPERTIES; MULTILAYER FILMS; NITROGEN COMPOUNDS; OPTICAL MULTILAYERS; TITANIUM DIOXIDE;

DC REACTIVE MAGNETRON SPUTTERING; DISCHARGE GAS; HARDER COATINGS; MIXTURE DISCHARGES; MULTILAYERED THIN FILMS; REACTIVE MAGNETRON SPUTTERING METHOD; SPUTTERING; SUBSTRATES TEMPERATURE; THIN-FILMS; TITANIUM TARGETS;

MULTILAYERS;

EID: 78449249668 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/j.mseb.2010.08.004 Document Type: Article

Times cited : (48)

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