Effect of substrate preparation and deposition conditions on the preferred orientation of TiN coatings deposited by RF reactive sputtering

Surface and Coatings Technology

Volumn 132, Issue 2-3, 2000, Pages 143-151

  Jones, M I ^b   McColl, I R ^a   Grant, D M ^a  

^a UNIVERSITY OF NOTTINGHAM   (United Kingdom)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Preferred crystallographic orientation; Reactive sputtering; Titanium nitride

Indexed keywords

CRYSTAL ORIENTATION; MAGNETRON SPUTTERING; SPUTTER DEPOSITION; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

PHYSICAL VAPOR DEPOSITION (PVD); RADIO FREQUENCY REACTIVE SPUTTERING;

PROTECTIVE COATINGS;

COATING; SPUTTERING; TITANIUM NITRIDE; VAPOR DEPOSITION; WEAR RESISTANCE;

EID: 0034292486     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00867-7     Document Type: Article

References (32)