Low temperature TiN deposition by ICP-assisted chemical vapor deposition

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 1234-1237

  Lee, Dong Kak ^a   Lee, Jung Joong ^a   Joo, Junghoon ^b  

^a Seoul National University   (South Korea)

^b Kunsan National University   (South Korea)

Author keywords

Chemical vapor deposition; Inductively coupled plasma; Low temperature

Indexed keywords

INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPUTTERING;

COIL ANTENNAS;

TITANIUM NITRIDE;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18144443941     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00472-9     Document Type: Article

References (13)

1. Morgan A.E. Broadbent E.K. Rits K.N. Sadana D.K. Burrow B.J. J. Appl. Phys. 64 1998 1
2. Wittmer M. Studer B. Melchior H. J. Appl. Phys. 52 1998 5772
3. Seefeld H.V. Cheung N.W. Mäenpää M. Nicolet M.A. IEEE Trans. Electron Devices ED 27 1980 873
4. A. Sherman, Ext. Abstr. Int. Conf. Solid State Devices and Materials, Yokohama, 1991, p. 151
5. Kim J.S. Jun B.H. Lee E.J. Hwang C.Y. Lee W.J. Thin Solid Films 292 1997 124
6. Lieberman M.A. Gottscho R.A. Francombe M.H. Vossen J.L. Physics of Thin Films, vol. 18 1994 10 Academic Press New York
7. Kim J.S. Lee E.J. Baek J.T. Lee W.J. Thin Solid Films 305 1997 103
8. Thorton J.A. J. Vac. Sci. Technol. A 4 1986 3059
9. Buiting M.J. Ottrloo A.F. Montree A.H. J. Electrochem. Soc. 138 1991 500
10. Tobe R. Sekiguchi A. Sasaki M. Okada S. Hosokawa N. Thin Solid Films 281 1996 155
11. Jang S.-S. Lee W.-J. Jpn. J. Appl. Phys. 40 2001 4819
12. Hiramatsu K. Ohnishi H. Takahama T. Yamanishi K.-I. J. Vac. Sci. Technol., Part A 14 3 1996 1037
13. Jeon Hyeongtag Lee J.W. Kim Y.D. Kim D.S. Yi K.S. J. Vac. Sci. Technol. A 18 4 2000 1595