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Volumn 83, Issue 1-3, 2001, Pages 242-248

Preparation and characterization of TiN films by electron cyclotron resonance (ECR) sputtering for diffusion barrier applications

(4) Deenamma Vargheese, K a Mohan Rao, G a Balasubramanian, T V b Kumar, Sanjiv c

a INDIAN INSTITUTE OF SCIENCE (India)

b DEFENCE METALLURGICAL RESEARCH LABORATORY (India)

c CCCM (India)

Author keywords

Diffusion barrier; Electron cyclotron resonance (ECR); TiN films

Indexed keywords

CATHODES; COPPER; CURRENT VOLTAGE CHARACTERISTICS; DIFFUSION IN SOLIDS; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRON CYCLOTRON RESONANCE; GLASS; ION BOMBARDMENT; MAGNETIC FIELD EFFECTS; METALLIZING; MIRRORS; SILICON; SPUTTER DEPOSITION; STOICHIOMETRY; STRESSES; SURFACE ROUGHNESS;

DEPTH PROFILING;

TITANIUM NITRIDE;

EID: 0035927869 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/S0921-5107(01)00535-9 Document Type: Article

Times cited : (22)

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