Effects of Ag nanoshape and AgGa phase in Ag-Si nanostructure using 2-step etching process

Journal of Alloys and Compounds

Volumn 509, Issue 3, 2011, Pages 758-763

  Hu, Zhan Shuo ^a   Hung, Fei Yi ^a   Chang, Shoou Jinn ^a   Chen, Kuan Jen ^a   Wang, Wen Long ^a   Young, Sheng Joue ^a   Chen, Tse Pu ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Ag; Etching; Focus ion beam (FIB); Nanostructure; Si

Indexed keywords

AG; AG FILMS; BEAM CURRENTS; CONCENTRATION GRADIENTS; ETCHING PROCESS; FOCUS ION BEAM; MICROPOROUS PHASIS; OXIDATIVE POTENTIAL; PROMINENT STRUCTURES; SI; SI NANOSTRUCTURES;

AUTOMOBILE DRIVERS; BEAM PLASMA INTERACTIONS; DRY ETCHING; ION BEAMS; ION BOMBARDMENT; IONS; NANOSTRUCTURES; SILICON; SILVER;

WET ETCHING;

EID: 78449244477     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2010.09.076     Document Type: Article

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