Crystallization effect of Al-Ag alloying layer in PL enhancement of ZnO thin film

Intermetallics

Volumn 18, Issue 8, 2010, Pages 1428-1431

  Hu, Zhan Shuo ^a   Hung, Fei Yi ^a   Chang, Shoou Jinn ^a,b   Chen, Kuan Jen ^a   Chen, Yue Zhang ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b Center for Micro/Nano Science and Technology   (Taiwan)

Author keywords

A. Intermetallics; B. Crystallization; C. Heat treatment

Indexed keywords

A. INTERMETALLICS; AG FILMS; ALLOYING EFFECT; ALLOYING LAYER; ANNEALING CONDITION; ANNEALING TEMPERATURES; B. CRYSTALLIZATION; C. HEAT TREATMENT; CRYSTALLIZATION EFFECTS; INTERFACE MECHANISMS; MULTILAYER STRUCTURES; OPTOELECTRONIC PROPERTIES; PL SPECTRA; RATIO OF AL; ZNO MATRIX; ZNO THIN FILM;

ALLOYING; ALUMINUM; ANNEALING; CRYSTALLIZATION; FILM PREPARATION; INTERMETALLICS; METALLIC FILMS; OPTICAL FILMS; THIN FILMS; VAPOR DEPOSITION; ZINC OXIDE;

SILVER;

EID: 77953652125     PISSN: 09669795     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.intermet.2010.03.020     Document Type: Article

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