Metal-assisted chemical etching of silicon in HF-H2O2

Electrochimica Acta

Volumn 53, Issue 17, 2008, Pages 5509-5516

  Chartier, C ^a   Bastide, S ^a   Levy Clement C ^a  

^a CNRS Université Paris Est Créteil Val de Marne   (France)

Author keywords

Assisted etching; HF H2O2 solutions; Polishing; Porous silicon; Silver nanoparticles

Indexed keywords

CATALYSTS; ETCHING; NANOSTRUCTURED MATERIALS; POLISHING;

ASSISTED ETCHING; SILVER NANOPARTICLES;

POROUS SILICON;

EID: 42749084714     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2008.03.009     Document Type: Article

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