Field emission from a periodic amorphous silicon pillar array fabricated by modified nanosphere lithography

Nanotechnology

Volumn 19, Issue 13, 2008, Pages

  Li, Wei ^a   Zhou, Jiang ^a   Zhang, Xian Gao ^a   Xu, Jun ^a   Xu, Ling ^a   Zhao, Weiming ^a   Sun, Ping ^a   Song, Fengqi ^a   Wan, Jianguo ^a   Chen, Kunji ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; FIELD EMISSION; LITHOGRAPHY; POLYSTYRENES; REACTIVE ION ETCHING; THIN FILMS;

GEOMETRICAL MORPHOLOGY; NANOSPHERE LITHOGRAPHY; SILICON PILLAR ARRAY;

AMORPHOUS SILICON;

NANOSPHERE; POLYSTYRENE; SILICON;

ARTICLE; CALCULATION; CRYSTAL STRUCTURE; MATERIALS TESTING; MORPHOLOGY; NANOCHEMISTRY; NANOFABRICATION; NANOTECHNOLOGY; PRIORITY JOURNAL;

EID: 40549133826     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/13/135308     Document Type: Article

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