Synergistic damage effects of vacuum ultraviolet photons and O2 in SiCOH ultra-low-k dielectric films

Journal of Physics D: Applied Physics

Volumn 43, Issue 42, 2010, Pages

  Lee, J ^a   Graves, D B ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION AND REACTIONS; DAMAGE EFFECTS; DIELECTRIC CONSTANTS; EX SITU; FLUENCES; FTIR; IN-SITU; METHYL RADICAL; NEAR-SURFACE; PLASMA PROCESS; PLASMA PROCESSING; PLASMA-INDUCED DAMAGE; PLASMA-SURFACE INTERACTIONS; POST-EXPOSURE; RADICAL ATTACKS; SAMPLE HEATING; SI DANGLING BONDS; SI-C BOND; SICOH FILMS; SILANOLS; ULTRA-LOW-K DIELECTRICS; VACUUM ULTRAVIOLETS; VUV LAMPS; VUV PHOTON; WATER VAPOUR;

ADSORPTION; DANGLING BONDS; DIELECTRIC DEVICES; DIELECTRIC FILMS; IONS; MASS SPECTROMETRY; MULTIPHOTON PROCESSES; PERMITTIVITY; PHOTONS; PLASMA DEVICES; PLASMA INTERACTIONS; SURFACE REACTIONS; SURFACES; VACUUM;

ION BOMBARDMENT;

EID: 78249284927     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/42/425201     Document Type: Article

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