Origin of dielectric loss induced by oxygen plasma on organo-silicate glass low-k dielectrics

Applied Physics Letters

Volumn 93, Issue 19, 2008, Pages

  Shi, H ^a   Bao, J ^a   Smith, R S ^a   Huang, H ^a   Liu, J ^a   Ho, P S ^a   McSwiney, M L ^b   Moinpour, M ^b   Kloster, G M ^b  

^a The University of Texas at Austin   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC CAPACITORS; DIELECTRIC DEVICES; DIELECTRIC LOSSES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; GLASS; INFRARED SPECTROSCOPY; IONIZATION OF LIQUIDS; OXYGEN; PLASMAS; POLARIZATION; QUANTUM THEORY; SILICATES; SPECTROSCOPIC ANALYSIS; SPECTROSCOPIC ELLIPSOMETRY;

CAPACITANCE VOLTAGES; DIELECTRIC CONSTANTS; DISPERSION RELATIONS; FOURIER TRANSFORM INFRARED; IONIC POLARIZATIONS; KRAMERS-KRONIG; LOW-K DIELECTRICS; OXYGEN PLASMAS; PHYSISORBED; POLARIZATION COMPONENTS; QUANTUM CHEMISTRY CALCULATIONS; SILICATE GLASSES; WATER MOLECULES;

DIELECTRIC MATERIALS;

EID: 56249117673     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3026528     Document Type: Article

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