Analysis of ultraviolet curing effect on the dielectric constant and molecular structure of a porous dielectric film

Journal of Electronic Materials

Volumn 39, Issue 10, 2010, Pages 2337-2345

  Smith, Ryan Scott ^a   Tsui, Ting ^b   Ho, Paul S ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b UNIVERSITY OF WATERLOO   (Canada)

Author keywords

Dielectric properties; Fourier transform infrared spectroscopy; Ultralow k dielectric; Ultraviolet curing

Indexed keywords

DIELECTRIC CONSTANTS; FTIR; POLARIZABILITIES; POROUS DIELECTRICS; POROUS ORGANOSILICATE; ULTRA-LOW-K DIELECTRICS; ULTRAVIOLET CURING; UV-CURING;

CURING; DIELECTRIC FILMS; INFRARED SPECTROSCOPY; KRAMERS-KRONIG RELATIONS; MOLECULAR STRUCTURE; PERMITTIVITY; POLARIZATION; X RAY PHOTOELECTRON SPECTROSCOPY;

FOURIER TRANSFORMS;

EID: 78149408520     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-010-1297-y     Document Type: Article

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