Process estimation and optimized recipes of ZnO:Ga thin film characteristics for transparent electrode applications

Expert Systems with Applications

Volumn 38, Issue 3, 2011, Pages 2823-2827

  Kim, Chang Eun ^a   Moon, Pyung ^a   Yun, Ilgu ^a   Kim, Sungyeon ^a   Myoung, Jae Min ^a   Jang, Hyeon Woo ^b   Bang, Jungsik ^b  

^a Yonsei University   (South Korea)

^b LG Chemical Ltd   (South Korea)

Author keywords

Figure of merit; Ga doped zinc oxide; Genetic algorithm; Neural networks; Optimization; Transparent conductive oxide

Indexed keywords

ANNEALING TEMPERATURES; ARTIFICIAL NEURAL NETWORK; ELECTRICAL AND OPTICAL PROPERTIES; FIGURE OF MERIT; GA-DOPED; GLASS SUBSTRATES; HYDROGEN ATMOSPHERE; OPTIMAL PROCESS; PROCESS ESTIMATION; ROOM TEMPERATURE; THERMAL-ANNEALING; TRANSPARENT CONDUCTIVE OXIDES; TRANSPARENT ELECTRODE; ZNO; ZNO:GA THIN FILMS;

ANNEALING; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; GALLIUM; GENETIC ALGORITHMS; NEURAL NETWORKS; OPTICAL PROPERTIES; OPTIMIZATION; OXIDE FILMS; SHEET RESISTANCE; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; ZINC; ZINC OXIDE;

GALLIUM ALLOYS;

EID: 78049528597     PISSN: 09574174     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.eswa.2010.08.074     Document Type: Article

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