Modeling of thermal annealing of Zno:Ga thin films for transparent conductive oxide using neural networks

Proceedings of the IASTED International Conference on Artificial Intelligence and Applications, AIA 2009

Volumn , Issue , 2009, Pages 152-157

  Kim, Chang Eun ^a,b   Moon, Pyung ^a,b   Kim, Sungyeon ^a,b   Jang, Hyeon Woo ^a,b   Bang, Jungsik ^a,b   Myoung, Jae Min ^a,b   Yun, Ilgu ^a,b  

^a Yonsei University   (South Korea)

^b LG Chemical Ltd   (South Korea)

Author keywords

Annealing; Neural networks; Response surface plot; Root mean square error; Transparent conductive oxide

Indexed keywords

ANNEALING NEURAL NETWORKS; ANNEALING PROCESS; ANNEALING TEMPERATURES; ELECTRICAL PROPERTY; ERROR BACK-PROPAGATION; FACTORIAL EXPERIMENTAL DESIGN; MODELING RESULTS; MULTI LAYER PERCEPTRON; NEURAL NETWORK MODEL; OUTPUT RESPONSE; OUTPUT VALUES; R SQUARE; RESPONSE SURFACE MODELS; RESPONSE SURFACE PLOT; ROOT MEAN SQUARE ERRORS; SURFACE PLOTS; THERMAL ANNEALING PROCESS; THERMAL-ANNEALING; TRANSPARENT CONDUCTIVE OXIDES; ZNO;

ANNEALING; BLOCK CODES; CARRIER MOBILITY; CONDUCTIVE FILMS; ELECTRIC PROPERTIES; EXPERIMENTS; FILM PREPARATION; GALLIUM; MEAN SQUARE ERROR; MULTILAYER FILMS; OXIDE FILMS; SURFACE PROPERTIES; THIN FILMS; ZINC OXIDE;

NEURAL NETWORKS;

EID: 74549156256     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (20)

1. V. Bhosle, J. T. Prater, Fan Yang, D. Burk, S. R. Forrest, & J. Narayan, Gallium-doped zinc oxide films as transparent electrodes for organic solar cell applications, J. Appl. Phys., 102(2), 2007, 023501-023505.
2. H. Kim, C. M. Gilmore, J. S. Horwitz, A. Pique, H. Murata, G. P. Kushto, R. Schlaf, & D. B. Chrisey, Transparent conducting aluminum-doped zinc oxide thin films for organic light-emitting devices, Appl. Phys. Lett., 76(3), 2000, 259-261.
3. E. Fortunato, V. Assuncao, A. Goncalves, A. Marques, H. Aguas, L. Pereira, I. Ferreira, P. Vilarinho, & R. Martins, High quality conductive gallium-doped zinc oxide films deposited at room temperature, Thin Solid Films, 451-452, 2004, 443-447.
4. Y. R. Park, E. K. Kim, D.-G Jung, T. S. Park, & Y. S. Kim, Growth of transparent conducting nano-structured In doped ZnO thin films by pulsed DC magnetron sputtering, Appl. Surf. Sci., 254(8), 2008, 2250-2254.
5. T. Minami, T. Miyata, Y. Ohtani, & Y. Mochizuki, New transparent conducting Al-doped ZnO flim preparation techniques for improving resistivity distribution in magnetron sputtering deposition, Jpn. J. Appl. Phys., 45(15), 2006, L409-L412.
6. K. H. Kim, K. C. Park, & D. Yo. Ma, Structural, electrical and optical properties of aluminum doped zinc oxide films prepared by radio frequency magnetron sputtering, J. Appl. Phys., 81(12), 1997, 7764-7772.
7. V. Bhosle, A. Tiwari, & J. Narayan, Electrical properties of transparent and conducting Ga doped ZnO, J. Appl. Phys., 100(3), 2006, 0337131-0337136.
8. J. K. Sheu, K. W. Shu, M. L. Lee, C. J. Tun, & G. C. Chi, Effect of Thermal Annealing on Ga-Doped ZnO Films Prepared by Magnetron Sputtering, J. Electrochem. Soc., 154(6), 2007, H521-H.524.
9. X. Yu, J. Ma, Fe. Ji, Y. Wang, X. Zhang, & H. Ma, Influence of annealing on the properties of ZnO:Ga films prepared by radio frequency magnetron sputtering, Thin Solid Films, 483(1-2), 2005, 296-300.
10. T. Tsuji & M. Hirohashi, Influence of oxygen partial pressure on transparency and conductivity of RF sputtered Al-doped ZnO thin films, Appl. Surf. Sci. 157(1-2), 2000, 47-51.
11. S.-S. Han & G. S. May, Using neural network process models to perform PECVD silicon dioxide recipe wynthesis via genetic algorithms, IEEE Trans. Semiconduct. Manufact., 10(2), 1997, 279-287.
12. C. D. Himmel & G. S. May, Advantages of plasma etch modeling using neural networks over statistical techniques, IEEE Trans. Semiconduct. Manufact., 6(2), 1993, 103-111.
13. S. Venkateswaran, M. M. Rai, T. R. Govindan, & M. Meyyappan, Neural Network Modeling of Growth Processes, J. Electrochem. Soc. 149(2), 2002, G137-G142.
14. G. S. May and C. J. Spanos, Fundamentals of semiconductor manufacturing and process control (Wiley & Sons, New Jersey: Wiley-Interscience, 2006)
15. D. C. Montgomery, Introduction to statistical quality control (Wiley & Sons, New Jersey: Wiley, 2004)
16. R. H. Mayers, & D. C. Montgomery, Response surface methodology (Wiley & Sons, New York: Wiley-Interscience, 1995)
17. Ü. Özgür, Ya. I. Alivov, C. Liu, A. Teke, M. A. Reshchikov, S. Doǧan, V. Avrutin, S.-J. Cho, & H. Morkoç, A comprehensive review of ZnO materials and devices, J. Appl. Phys., 98(4), 2005, 041301.1-103.
18. G. J. Fang, D. J. Li, & B.-L. Yao, Effect of vacuum annealing on the Properties of transparent conductive AZO thin films prepared by DC magnetron sputtering, Phys. Status Solidi (a), 193(1), 2002, 139-152,.
19. 0.1O thin films prepared by pulsed laser de position technique, Appl. Surf. Sci. 252 (24), 2006, 8657-8661.
20. T. Minami, H. Sato, K. Ohashi, T. Tomofuji, & S. Takata, Conduction mechanism of highly conductive and transparent zinc oxide thin films prepared by magnetron sputtering, J. Cryst. Growth, 117(1-4), 1992, 370-374.