Characteristics of zirconium-doped indium tin oxide thin films deposited by magnetron sputtering

Solar Energy Materials and Solar Cells

Volumn 92, Issue 10, 2008, Pages 1224-1229

  Zhang, Bo ^a   Dong, Xianping ^a   Xu, Xiaofeng ^b   Zhao, Pei ^c   Wu, Jiansheng ^a  

^a BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

^b DONGHUA UNIVERSITY   (China)

^c SHANGHAI INSTITUTE OF TECHNICAL PHYSICS   (China)

Author keywords

Indium tin oxide; Magnetron sputtering; Transparent conductive oxide; Zirconium

Indexed keywords

COBALT; ELECTRIC RESISTANCE; FLOW RATE; GLASS; HEALTH; MAGNETRON SPUTTERING; OPTICAL GLASS; OXIDE FILMS; OXYGEN; SOLIDS; SUBSTRATES; SURFACE ROUGHNESS; SURFACE STRUCTURE; THICK FILMS; THIN FILMS; TIN; TITANIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS; ZIRCONIA; ZIRCONIUM;

(1 1 0) SURFACE; (PL) PROPERTIES; BAND GAPS; CO-SPUTTERING; CRYSTALLINE STRUCTURES; DIRECT TRANSITION; ELECTRICAL CHARACTERISTICS; ELSEVIER (CO); GLASS SUBSTRATES; INDIUM TIN OXIDE (ITO) THIN FILMS; OPTICAL (PET) (OPET); OPTICAL TRANSMITTANCE (T); OPTICAL- (OPET); OPTIMUM PARAMETERS; OXYGEN FLOW RATE (OFR); SUBSTRATE TEMPERATURE (ST); TRANSMITTANCE SPECTRUM; XRD SPECTRA;

OPTICAL FILMS;

EID: 47049105015     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2008.04.019     Document Type: Article

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