Factors affecting the accuracy of high resolution electron backscatter diffraction when using simulated patterns

Ultramicroscopy

Volumn 110, Issue 12, 2010, Pages 1443-1453

  Britton, T B ^a   Maurice, C ^b   Fortunier, R ^b   Driver, J H ^b   Day, A P ^c   Meaden, G ^d   Dingley, D J ^e   Mingard, K ^f   Wilkinson, A J ^a  

^a UNIVERSITY OF OXFORD   (United Kingdom)

^b ECOLE DES MINES DE SAINT ETIENNE   (France)

^c Aunt Daisy Scientific Ltd   (United Kingdom)

^d BLG Productions   (United Kingdom)

^e UNIVERSITY OF BRISTOL   (United Kingdom)

^f NATIONAL PHYSICAL LABORATORY   (United Kingdom)

Author keywords

Calibration; EBSD; Electron backscatter diffraction; Electron diffraction; Scanning electron microscope; Strain

Indexed keywords

CALIBRANTS; DEPTH OF FIELD; EBSD; ELECTRON BACKSCATTER DIFFRACTION; ELECTRON BACKSCATTERING PATTERNS; FAR-FIELD REGION; HIGH RESOLUTION; HIGH RESOLUTION ELECTRON BACKSCATTER DIFFRACTIONS; IMAGE SHIFTS; INTENSITY VARIATIONS; KINEMATIC MODEL; KINEMATIC SIMULATIONS; PRECISE MEASUREMENTS; SCANNING ELECTRON MICROSCOPE; SEM; SIMULATION MODEL; STRAIN STATE; STRUCTURE FACTORS; ZONE AXIS;

BACKSCATTERING; CALIBRATION; COMPUTER SIMULATION; ELECTRON MICROSCOPES; ELECTRONS; KINEMATICS; ROTATION; SCANNING; SCANNING ELECTRON MICROSCOPY; STRAIN MEASUREMENT;

ELECTRON DIFFRACTION;

ACCURACY; ARTICLE; CALIBRATION; CAMERA; ELASTICITY; ELECTRON BACKSCATTER DIFFRACTION; ELECTRON BACKSCATTERING PATTERN; ELECTRON DIFFRACTION; GEOMETRY; IMAGE DISPLAY; KINEMATICS; OPTICS; ROTATION; SIMULATION; UNCERTAINTY;

EID: 78049287672     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2010.08.001     Document Type: Article

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